AMOLF Institutional Repository
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Mass and energy distribution of particles sputter etched from Si in a XeF2 environment Article
Appl. Phys. Lett., 174-175.January 1982 -
Laser processing in silicon molecular beam epitaxy In Proceedings
T. de Jong, L. Smit and F.W. Saris
January 1982 -
Interface electronic structure of Pb on GaAs(001) Article
J. Vac. Sci. Technol., 375-379.J.F. van der Veen, L. Smit, P.K. Larsen, J.H. Neave and B.A. Joyce
January 1982 -
Cationization in laser desorption mass spectrometry Article
Nucl. Instrum. Methods Phys. Res., 125-130.G.J.Q. van der Peyl, K. Isa, J.R. Haverkamp and P.G. Kistemaker
January 1982 -
January 1982
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An ion-scattering study of oxygen indiffusion during pulsed laser annealing/cleaning of silicon In Proceedings
January 1982 -
Chemisorption-induced 4¦-core-electron binding-energy shifts for surface atoms of W(111), W(100), and Ta(111) Article
Phys. Rev. B, 7388-7397.January 1982 -
Radiative corrections to atomic photoeffect and tip bremsstrahlung III Article
Phys. Rev. A, 237-249.January 1982