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AMOLF Institutional Repository

Selected Open Access and other scholarly publications from AMOLF and related researchers.
  • Near threshold sputtering of Si and Si02 in a CI2 environment Article

    Appl. Phys. Lett., 1506-1508.

    D.J. Oostra, R.P. van Ingen, R.A. Haring, A.E. de Vries and G.N.A. van Veen

    January 1987
  • Comment on "Evidence for correlated double-electron capture in low-energy collisions of O6+ with He" Article

    Phys. Rev. Lett.

    H. Winter, M. Mack, R. Hoekstra (Ronnie), A. Niehaus and F.J. de Heer

    January 1987
  • Computer simulation of hard-core models for liquid crystals Article

    Comput. Phys. Commun., 243-253.

    D. Frenkel

    January 1987
  • Organic geochemical aspects of cyanobacterial mats Book Chapter

    J.J. Boon and J.W. de Leeuw

    January 1987
  • Influence of highly charged impurities on ion temperatures measured with active-beam plasma diagnostics Article

    J. Appl. Phys., 780-786.

    A.J.H. Donn and F.J. de Heer

    January 1987
  • Summary Abstract: Nanosecond ultraviolet laser induced etching of Si and Cu exposed to Cl2 Article

    J. Vac. Sci. Technol. A

    G.N.A. van Veen, T.S. Baller, J. Dieleman and A.E. de Vries

    January 1987
  • Summary Abstract: Extended x-ray absorption fine-structure features in the reflectivity of x-ray multilayers Article

    J. Vac. Sci. Technol. A, 2028-2029.

    H. van Brug, M.J. van der Wiel, M.P. Bruijn and J. Verhoeven (Jan)

    January 1987
  • A magnetron reactor for high flux reactive ion etching In Proceedings

    A.D. Kuypers and H.J. Hopman

    January 1987
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