AMOLF Institutional Repository
-
Near threshold sputtering of Si and Si02 in a CI2 environment Article
Appl. Phys. Lett., 1506-1508.D.J. Oostra, R.P. van Ingen, R.A. Haring, A.E. de Vries and G.N.A. van Veen
January 1987 -
Comment on "Evidence for correlated double-electron capture in low-energy collisions of O6+ with He" Article
Phys. Rev. Lett.H. Winter, M. Mack, R. Hoekstra (Ronnie), A. Niehaus and F.J. de Heer
January 1987 -
Computer simulation of hard-core models for liquid crystals Article
Comput. Phys. Commun., 243-253.January 1987 -
Organic geochemical aspects of cyanobacterial mats Book Chapter
January 1987 -
Influence of highly charged impurities on ion temperatures measured with active-beam plasma diagnostics Article
J. Appl. Phys., 780-786.January 1987 -
Summary Abstract: Nanosecond ultraviolet laser induced etching of Si and Cu exposed to Cl2 Article
J. Vac. Sci. Technol. AJanuary 1987 -
Summary Abstract: Extended x-ray absorption fine-structure features in the reflectivity of x-ray multilayers Article
J. Vac. Sci. Technol. A, 2028-2029.H. van Brug, M.J. van der Wiel, M.P. Bruijn and J. Verhoeven (Jan)
January 1987 -
A magnetron reactor for high flux reactive ion etching In Proceedings
January 1987