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AMOLF Institutional Repository

Selected Open Access and other scholarly publications from AMOLF and related researchers.
  • Summary Abstract: Nanosecond ultraviolet laser induced etching of Si and Cu exposed to Cl2 Article

    J. Vac. Sci. Technol. A

    G.N.A. van Veen, T.S. Baller, J. Dieleman and A.E. de Vries

    January 1987
  • Summary Abstract: Extended x-ray absorption fine-structure features in the reflectivity of x-ray multilayers Article

    J. Vac. Sci. Technol. A, 2028-2029.

    H. van Brug, M.J. van der Wiel, M.P. Bruijn and J. Verhoeven (Jan)

    January 1987
  • A magnetron reactor for high flux reactive ion etching In Proceedings

    A.D. Kuypers and H.J. Hopman

    January 1987
  • Quantum-state detection of particles effusing from an H2 ion source In Proceedings

    P.J. Eenshuistra, J.H.M. Bonnie and H.J. Hopman

    January 1987
  • Summary Abstract: Rainbow scattering, charge exchange, and implantation of Na on Ag(111) Article

    J. Vac. Sci. Technol. A, 656-657.

    T.C.M. Horn, H.C. Pan and A.W. Kleyn

    January 1987
  • Molecular-beam scattering of O2 and Ar from Ag(111) Article

    J. Vac. Sci. Technol. A, 469-500.

    M.E.M. Spruit, E.W. Kuipers, M.G. Tenner, J.T.N. Kimman and A.W. Kleyn

    January 1987
  • Summary Abstract: Ion-beam crystallography of semiconductor interfaces and heteroepitaxial films Article

    J. Vac. Sci. Technol. A

    J.F. van der Veen

    January 1987
  • Li- formation at low normal velocities Article

    Surf. Sci., 15-25.

    J.J.C. Geerlings, R. Rodink, J.H. Los and J.P. Gauyacq

    January 1987
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