AMOLF Institutional Repository
-
Ion-assisted etching of Si and SiO2 by halogens In Proceedings
January 1989 -
Depolarization of femtosecond laser pulses in disordered media Article
Opt. Commun., 365-368.January 1989 -
Energy recovery for negative ion based neutral beam lines Article
Nucl. Fusion, 685-689.January 1989 -
Branching ratios and lifetimes for the dissociative decay of triplet H2* Article
J. Chem. Phys., 4826-4834.January 1989 -
Tailoring of the rf properties of a multichannel accelerator for MeV energies Article
Nucl. Instrum. Methods Phys. Res. A, 318-328.R.-G.C. Wojke, W.H. Urbanus, R.J.J.M. Steenvoorden, J.G. Bannenberg, H. Klein, A. Schempp, R.W. Thomae, T. Weis and P.W. van Amersfoort
January 1989 -
Reduction of the X-ray level of DC ion accelerators Article
Nucl. Instrum. Methods Phys. Res. A, 339-348.W.H. Urbanus, J.G. Bannenberg, F.W. Saris, R. Koudijs, P. Dubbelman and W.A. Koelewijn
January 1989 -
Trapping-desorption of O2 from Ag(111) Article
Surf. Sci., 421-436.January 1989 -
Measurement of picosecond-pulse durations in the ultraviolet Article
Rev. Sci. Instrum., 835-838.L.D. Noordam, A. ten Wolde and H.B. van Linden van den Heuvell
January 1989