The influence of channeling on Cu single-crystal sputtering

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Journal	Appl. Phys. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Onderdelinden, D. (1966). The influence of channeling on Cu single-crystal sputtering. Appl. Phys. Lett., 8, 189–190.

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