Copper single crystal sputtering in the temperature range from 50 K to 600 K

1971

Radiat. Eff. , Volume 10 p. 175- 184

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Journal	Radiat. Eff.
Citation APA-ALL APA Style APA-ALL Style AAA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Elich, J. J. P., Roosendaal, H. E.& Onderdelinden, D. (1971). Copper single crystal sputtering in the temperature range from 50 K to 600 K. Radiat. Eff., 10, 175–184.

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