Dependence of the temperature behaviour of the sputtering ratio on the channelled fraction of the ion beam

1973

Radiat. Eff. , Volume 19 p. 127- 128

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Journal	Radiat. Eff.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Roosendaal, H. E., & Elich, J. J. P. (1973). Dependence of the temperature behaviour of the sputtering ratio on the channelled fraction of the ion beam. Radiat. Eff., 19, 127–128.

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