Crystalline and electrical characteristics of silicon films deposited by ionized-cluster-beams

1980

Jpn. J. Appl. Phys. , Volume 19 p. 181- 184

Additional Metadata
Journal	Jpn. J. Appl. Phys.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Yamada, I., Saris, F. W., Takagi, T., Matsubara, K., Takaoka, H., & Ishiyama, S. (1980). Crystalline and electrical characteristics of silicon films deposited by ionized-cluster-beams. Jpn. J. Appl. Phys., 19, 181–184.

Publication