Crystalline and electrical characteristics of silicon films deposited by ionized-cluster-beams

1980

Jpn. J. Appl. Phys. , Volume 19 p. 181- 184

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Journal	Jpn. J. Appl. Phys.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Yamada, I, Saris, F.W, Takagi, T, Matsubara, K, Takaoka, H, & Ishiyama, S. (1980). Crystalline and electrical characteristics of silicon films deposited by ionized-cluster-beams. Jpn. J. Appl. Phys., 19, 181–184.

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