1980
Crystalline and electrical characteristics of silicon films deposited by ionized-cluster-beams
Publication
Publication
Jpn. J. Appl. Phys. , Volume 19 p. 181- 184
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Jpn. J. Appl. Phys. | |
Yamada, I, Saris, F.W, Takagi, T, Matsubara, K, Takaoka, H, & Ishiyama, S. (1980). Crystalline and electrical characteristics of silicon films deposited by ionized-cluster-beams. Jpn. J. Appl. Phys., 19, 181–184.
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