Mass and energy distribution of particles sputter etched from Si in a XeF2 environment

1982-01-01

Appl. Phys. Lett. , Volume 41 p. 174- 175

Additional Metadata
Persistent URL	dx.doi.org/10.1063/1.93451
Journal	Appl. Phys. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Haring, R. A, Haring, R. A, Saris, F.W, & de Vries, A. E. (1982). Mass and energy distribution of particles sputter etched from Si in a XeF2 environment. Appl. Phys. Lett., 41, 174–175. doi:10.1063/1.93451

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