Additional Metadata
Persistent URL dx.doi.org/10.1063/1.93451
Journal Appl. Phys. Lett.
Citation
Haring, R. A, Haring, R. A, Saris, F.W, & de Vries, A. E. (1982). Mass and energy distribution of particles sputter etched from Si in a XeF2 environment. Appl. Phys. Lett., 41, 174–175. doi:10.1063/1.93451