1982
Mass and energy distribution of particles sputter etched from Si in a XeF2 environment
Publication
Publication
Appl. Phys. Lett. , Volume 41 p. 174- 175
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dx.doi.org/10.1063/1.93451 | |
Appl. Phys. Lett. | |
Haring, R. A, Haring, R. A, Saris, F.W, & de Vries, A. E. (1982). Mass and energy distribution of particles sputter etched from Si in a XeF2 environment. Appl. Phys. Lett., 41, 174–175. doi:10.1063/1.93451
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