An ion-scattering study of oxygen indiffusion during pulsed laser annealing/cleaning of silicon

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Publisher	North-Holland
Editor	B. R. Appleton , G. K. Celler
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Westendorp, J. F. M, Wang, Z. L, & Saris, F.W. (1982). An ion-scattering study of oxygen indiffusion during pulsed laser annealing/cleaning of silicon. In B. R Appleton & G. K Celler (Eds.), Laser and Electron-Beam Interactions with Solids : Proceedings of the Materials Research Society Annual Meeting, November 1981, Boston Park Plaza Hotel, Boston, Massachusetts, U.S.A. (pp. 255–260). North-Holland.

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