An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(a, a0)16O resonance scattering

1983

Additional Metadata
Journal	Nucl. Instrum. Methods Phys. Res.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Wang, Z. L., Westendorp, J. F. M., & Saris, F. W. (1983). An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(a, a0)16O resonance scattering. Nucl. Instrum. Methods Phys. Res., 211, 193–201.

Publication