1983-01-01
An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(a, a0)16O resonance scattering
Publication
Publication
Nucl. Instrum. Methods Phys. Res.
,
Volume 211
p. 193-
201
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| Journal | Nucl. Instrum. Methods Phys. Res. |
| Citation |
Wang, Z. L, Westendorp, J. F. M, & Saris, F.W. (1983). An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(a, a0)16O resonance scattering. Nucl. Instrum. Methods Phys. Res., 211, 193–201.
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