An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(a, a0)16O resonance scattering

1983

Nucl. Instrum. Methods Phys. Res. , Volume 211 p. 193- 201

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Journal	Nucl. Instrum. Methods Phys. Res.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Wang, Z. L, Westendorp, J. F. M, & Saris, F.W. (1983). An investigation of oxygen indiffusion during laser cleaning/annealing of silicon by means of the 16O(a, a0)16O resonance scattering. Nucl. Instrum. Methods Phys. Res., 211, 193–201.

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