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A. W. Kolfschoten, R. A. Haring, R. A. Haring and A. E. de Vries

1984

Argon-ion assisted etching of silicon by molecular chlorine

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J. Appl. Phys. , Volume 55 p. 3813- 3818

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Kolfschoten, A. W, Haring, R. A, Haring, R. A, & de Vries, A. E. (1984). Argon-ion assisted etching of silicon by molecular chlorine. J. Appl. Phys., 55, 3813–3818.

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