Ion-assisted etching of silicon by molecular chorine

1984

J. Vac. Sci. Technol. A , Volume 2 p. 487- 491

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Journal	J. Vac. Sci. Technol. A
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Sanders, F. H. M., Kolfschoten, A. W., Dieleman, J., Haring, R. A., Haring, R. A., & de Vries, A. E. (1984). Ion-assisted etching of silicon by molecular chorine. J. Vac. Sci. Technol. A, 2, 487–491.

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