Failure temperature of amorphous Cu-Ta alloys as diffusion barriers in Al-Si contacts

1985

Appl. Phys. Lett. , Volume 46 p. 646- 648

Additional Metadata
Journal	Appl. Phys. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Saris, F. W., Hung, L. S., Nastasi, M., Mayer, J. W., & Whitehead, B. (1985). Failure temperature of amorphous Cu-Ta alloys as diffusion barriers in Al-Si contacts. Appl. Phys. Lett., 46, 646–648.

Publication