We describe how optical contact lithography based on plasmon particle array masks allows generation of a large number of different subwavelength exposure patterns using a single mask. Within an exact point dipole model, we study the local response of silver particles in small two-dimensional arrays with 50-200 nm spacing. We show how illumination with unfocused light allows optically addressing particles either individually or in controlled configurations; which pattern will be exposed by the mask is programmed by varying the wavelength, incidence angle, and polarization of the incident wave.

Nano Lett.
Photonic Materials

Koenderink, F., Hernández, J. V., Robicheaux, F., Noordam, L. D., & Polman, A. (2007). Programmable nanolithography with plasmon nanoparticle arrays. Nano Lett., 7, 745–749. doi:10.1021/nl0630034