2007
Programmable nanolithography with plasmon nanoparticle arrays
Publication
Publication
Nano Lett. , Volume 7 p. 745- 749
We describe how optical contact lithography based on plasmon particle array masks allows generation of a large number of different subwavelength exposure patterns using a single mask. Within an exact point dipole model, we study the local response of silver particles in small two-dimensional arrays with 50-200 nm spacing. We show how illumination with unfocused light allows optically addressing particles either individually or in controlled configurations; which pattern will be exposed by the mask is programmed by varying the wavelength, incidence angle, and polarization of the incident wave.
| Additional Metadata | |
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| doi.org/10.1021/nl0630034 | |
| Nano Lett. | |
| Organisation | Photonic Materials |
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Koenderink, F., Hernández, J. V., Robicheaux, F., Noordam, L. D., & Polman, A. (2007). Programmable nanolithography with plasmon nanoparticle arrays. Nano Lett., 7, 745–749. doi:10.1021/nl0630034 |
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