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D. J. Oostra, R. A. Haring, A. E. de Vries, F. H. M. Sanders and K. Miyake

1985-01-01

Ion-assisted etching of silicon by SF6

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Appl. Phys. Lett. , Volume 46 p. 1166- 1168

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Oostra, D. J, Haring, R. A, de Vries, A. E, Sanders, F. H. M, & Miyake, K. (1985). Ion-assisted etching of silicon by SF6. Appl. Phys. Lett., 46, 1166–1168.

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