Ion-assisted etching of silicon by SF6

1985

Appl. Phys. Lett. , Volume 46 p. 1166- 1168

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Journal	Appl. Phys. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Oostra, D. J, Haring, R. A, de Vries, A. E, Sanders, F. H. M, & Miyake, K. (1985). Ion-assisted etching of silicon by SF6. Appl. Phys. Lett., 46, 1166–1168.

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