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Journal J. Vac. Sci. Technol. B
Dieleman, J, Sanders, F. H. M, Kolfschoten, A. W, Zalm, P. C, de Vries, A. E, & Haring, R. A. (1985). Studies on the mechanism of chemical sputtering of silicon by simultaneous exposure to Cl2 and low-energy Ar+ ions. J. Vac. Sci. Technol. B, 3, 1384–1392.