Formation of negative hydrogen ions on a cesiated W(110) surface: the influence of hydrogen implantation

1985

J. Appl. Phys. , Volume 58 p. 3566- 3572

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Journal	J. Appl. Phys.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	van Amersfoort, P. W., Geerlings, J. J. C., Kwakman, L. F. T., Hershcovitch, A., Granneman, E. H. A., & Los, J. H. (1985). Formation of negative hydrogen ions on a cesiated W(110) surface: the influence of hydrogen implantation. J. Appl. Phys., 58, 3566–3572.

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