Electron and ion beam activated solid phase epitaxy of ion-implanted silicon

1985

Additional Metadata
Publisher	Editions de Physique
Editor	V.T. Nguyen , A.G. Cullis
Organisation	Photonic Materials
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Miyao, M, Polman, A, van Kemp, R, Westendorp, J.F.M, Sinke, W.C, van der Veen, J.F, & Saris, F.W. (1985). Electron and ion beam activated solid phase epitaxy of ion-implanted silicon. In V.T Nguyen & A.G Cullis (Eds.), Energy Beam-Solid Interactions and Transient Thermal Processing, 1985, IV : May 13th - 15th 1985, Strasbourg (France) (pp. 181–185). Editions de Physique.

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