Etching of silicon by SF6 induced by ion bombardment

1986

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Journal	Nucl. Instrum. Methods Phys. Res. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Oostra, D.J, Haring, R.A, de Vries, A.E, Sanders, F.H.M, & van Veen, G.N.A. (1986). Etching of silicon by SF6 induced by ion bombardment. Nucl. Instrum. Methods Phys. Res., Sect B, 13, 556–560.

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