1986
Electron irradiation-activated low-temperature annealing of phosphorus-implanted silicon
Publication
Publication
Appl. Phys. Lett. , Volume 48 p. 1132- 1134
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Appl. Phys. Lett. | |
Organisation | Photonic Materials |
Miyao, M, Polman, A, Sinke, W.C, Saris, F.W, & van Kemp, R. (1986). Electron irradiation-activated low-temperature annealing of phosphorus-implanted silicon. Appl. Phys. Lett., 48, 1132–1134.
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