Additional Metadata
Journal Appl. Phys. Lett.
Citation
Miyao, M, Polman, A, Sinke, W.C, Saris, F.W, & van Kemp, R. (1986). Electron irradiation-activated low-temperature annealing of phosphorus-implanted silicon. Appl. Phys. Lett., 48, 1132–1134.