Material reaction and silicide formation at the refractory metal/silicon interface

1986

Appl. Phys. Lett. , Volume 48 p. 1600- 1602

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Journal	Appl. Phys. Lett.
Citation APA-ALL APA Style APA-ALL Style AAA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Rubloff, G. W., Tromp, R. M.& van Loenen, E. J. (1986). Material reaction and silicide formation at the refractory metal/silicon interface. Appl. Phys. Lett., 48, 1600–1602.

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