Electron-induced etching of silicon by SF6

1986-01-01

Nucl. Instrum. Methods Phys. Res. B , Volume 16 p. 364- 368

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Journal	Nucl. Instrum. Methods Phys. Res. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Oostra, D. J, Haring, R. A, & de Vries, A. E. (1986). Electron-induced etching of silicon by SF6. Nucl. Instrum. Methods Phys. Res. B, 16, 364–368.

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