Sputtering of SiO2 in a XeF2 and in a Cl2 atmosphere

1986

J. Vac. Sci. Technol. B , Volume 4 p. 1278- 1282

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Journal	J. Vac. Sci. Technol. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Oostra, D. J, Haring, R. A, & de Vries, A. E. (1986). Sputtering of SiO2 in a XeF2 and in a Cl2 atmosphere. J. Vac. Sci. Technol. B, 4, 1278–1282.

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