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D. J. Oostra, R. A. Haring and A. E. de Vries

1986

Sputtering of SiO2 in a XeF2 and in a Cl2 atmosphere

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J. Vac. Sci. Technol. B , Volume 4 p. 1278- 1282

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Journal J. Vac. Sci. Technol. B
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Oostra, D. J, Haring, R. A, & de Vries, A. E. (1986). Sputtering of SiO2 in a XeF2 and in a Cl2 atmosphere. J. Vac. Sci. Technol. B, 4, 1278–1282.

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