Additional Metadata
Journal Nucl. Instrum. Methods Phys. Res. B
Citation
van Veen, G. N. A, Sanders, F. H. M, Dieleman, J, Zalm, P. C, Oostra, D. J, & de Vries, A. E. (1987). Extension of the model for Ar+ ion induced etching of Si by SF6. Nucl. Instrum. Methods Phys. Res. B, 19/20, 1022–1025.