1987
Extension of the model for Ar+ ion induced etching of Si by SF6
Publication
Publication
Nucl. Instrum. Methods Phys. Res. B , Volume 19/20 p. 1022- 1025
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Nucl. Instrum. Methods Phys. Res. B | |
van Veen, G. N. A, Sanders, F. H. M, Dieleman, J, Zalm, P. C, Oostra, D. J, & de Vries, A. E. (1987). Extension of the model for Ar+ ion induced etching of Si by SF6. Nucl. Instrum. Methods Phys. Res. B, 19/20, 1022–1025.
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