Influence of highly charged impurities on ion temperatures measured with active-beam plasma diagnostics

1987

J. Appl. Phys. , Volume 62 p. 780- 786

Additional Metadata
Journal	J. Appl. Phys.
Citation APA-ALL APA Style APA-ALL Style AAA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Donn, A. J. H.& de Heer, F. J. (1987). Influence of highly charged impurities on ion temperatures measured with active-beam plasma diagnostics. J. Appl. Phys., 62, 780–786.

Publication