A magnetron reactor for high flux reactive ion etching

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Publisher	A. Hilger
Editor	W. T. Williams
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Kuypers, A. D, & Hopman, H. J. (1987). A magnetron reactor for high flux reactive ion etching. In W. T Williams (Ed.), XVIII International Conference on Phenomena in Ionized Gases, Swansea, 13th-17th July 1987 : Contributed Papers (pp. 800–801). A. Hilger.

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