1987
A magnetron reactor for high flux reactive ion etching
Publication
Publication
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A. Hilger | |
W. T. Williams | |
Kuypers, A. D, & Hopman, H. J. (1987). A magnetron reactor for high flux reactive ion etching. In W. T Williams (Ed.), XVIII International Conference on Phenomena in Ionized Gases, Swansea, 13th-17th July 1987 : Contributed Papers (pp. 800–801). A. Hilger.
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