A magnetic multipole reactor for high-flux reactive-ion etching

1988-01-01

J. Appl. Phys. , Volume 63 p. 1899- 1903

Additional Metadata
Journal	J. Appl. Phys.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Kuypers, A. D, Granneman, E. H. A, & Hopman, H. J. (1988). A magnetic multipole reactor for high-flux reactive-ion etching. J. Appl. Phys., 63, 1899–1903.

Publication