1988
Mechanisms of sputtering of Si in a Cl2 environment by ions with energies down to 75 eV
Publication
Publication
J. Appl. Phys. , Volume 64 p. 315- 322
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J. Appl. Phys. | |
Oostra, D. J, Haring, R. A, van Ingen, R. P, & de Vries, A. E. (1988). Mechanisms of sputtering of Si in a Cl2 environment by ions with energies down to 75 eV. J. Appl. Phys., 64, 315–322.
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