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Journal J. Appl. Phys.
Citation
Oostra, D. J, Haring, R. A, van Ingen, R. P, & de Vries, A. E. (1988). Mechanisms of sputtering of Si in a Cl2 environment by ions with energies down to 75 eV. J. Appl. Phys., 64, 315–322.