Growth of uniform epitaxial CoSi2 films on Si (111)

1988

J. Appl. Phys. , Volume 64 p. 3005- 3013

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Journal	J. Appl. Phys.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Fischer, A. E. M. J., Slijkerman, W. F. J., Nakagawa, K., Smith, R. J., van der Veen, J. F., & Bulle-Lieuwma, C. W. T. (1988). Growth of uniform epitaxial CoSi2 films on Si (111). J. Appl. Phys., 64, 3005–3013.

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