Additional Metadata
Journal Appl. Phys. Lett.
Citation
Lu, W. X, Qian, Y. H, Tian, R. H, Wang, Z. L, Schreutelkamp, R, Liefting, J. R, & Saris, F.W. (1989). Reduction of secondary defect formation in MeV B+ ion-implanted Si (100). Appl. Phys. Lett., 55, 1838–1840.