1989
Reduction of secondary defect formation in MeV B+ ion-implanted Si (100)
Publication
Publication
Appl. Phys. Lett. , Volume 55 p. 1838- 1840
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Appl. Phys. Lett. | |
Lu, W. X, Qian, Y. H, Tian, R. H, Wang, Z. L, Schreutelkamp, R, Liefting, J. R, & Saris, F.W. (1989). Reduction of secondary defect formation in MeV B+ ion-implanted Si (100). Appl. Phys. Lett., 55, 1838–1840.
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