High flux low energy reactive ion etching in a magnetic multipole reactor

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Publisher	Publication Office, Japanese Journal of Applied Physics
Editor	S. Namba , T. Kitayama
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Kuypers, A. D., Hopman, H. J., & Granneman, E. H. A. (1989). High flux low energy reactive ion etching in a magnetic multipole reactor. In S. Namba & T. Kitayama (Eds.), MicroProcess 89 : Proceedings of the 1989 International Symposium on MicroProcess Conference, July 2-5, 1989, Kobe, Japan (pp. 205–208).

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