Additional Metadata
Publisher Publication Office, Japanese Journal of Applied Physics
Editor S. Namba , T. Kitayama
Citation
Kuypers, A. D, Hopman, H. J, & Granneman, E. H. A. (1989). High flux low energy reactive ion etching in a magnetic multipole reactor. In S Namba & T Kitayama (Eds.), MicroProcess 89 : Proceedings of the 1989 International Symposium on MicroProcess Conference, July 2-5, 1989, Kobe, Japan (pp. 205–208). Publication Office, Japanese Journal of Applied Physics.