Structural and electrical characterization of Si(100) implanted with P+ and Si+ ions along the [100] channelling direction

1990

Mater. Sci. Eng. B , Volume 7 p. 149- 165

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Journal	Mater. Sci. Eng. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Schreutelkamp, R., de Reus, R., Saris, F. W., Kaim, R. E., Westendorp, J. F. M., Janssen, K. T. F., & Ottenheim, J. J. M. (1990). Structural and electrical characterization of Si(100) implanted with P+ and Si+ ions along the [100] channelling direction. Mater. Sci. Eng. B, 7, 149–165.

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