Stability of amorphous Ir-Ta diffusion barriers between Cu and Si

1990-01-01

Mater. Lett. , Volume 9 p. 500- 503

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Journal	Mater. Lett.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	de Reus, R, Koper, R. J. I. M, Zeijlemaker, H, & Saris, F.W. (1990). Stability of amorphous Ir-Ta diffusion barriers between Cu and Si. Mater. Lett., 9, 500–503.

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