Channeling implantation of B and P in silicon

1991-01-01

Nucl. Instrum. Methods Phys. Res. B , Volume 55 p. 615- 619

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Journal	Nucl. Instrum. Methods Phys. Res. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Schreutelkamp, R, Raineri, V, Saris, F.W, Kaim, R. E, Westendorp, J. F. M, van der Meulen, P. F. H. M, & Janssen, K. T. F. (1991). Channeling implantation of B and P in silicon. Nucl. Instrum. Methods Phys. Res. B, 55, 615–619.

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