Channeling implantation of B and P in silicon

1991

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Journal	Nucl. Instrum. Methods Phys. Res. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Schreutelkamp, R, Raineri, V, Saris, F.W, Kaim, R.E, Westendorp, J.F.M, van der Meulen, P.F.H.M, & Janssen, K.T.F. (1991). Channeling implantation of B and P in silicon. Nucl. Instrum. Methods Phys. Res., Sect B, 55, 615–619.

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