Additional Metadata
Journal Nucl. Instrum. Methods Phys. Res. B
Citation
Raineri, V, Schreutelkamp, R, Saris, F.W, Kaim, R. E, & Janssen, K. T. F. (1991). Secondary defect reduction by channeling implantation of B and P in <100> silicon. Nucl. Instrum. Methods Phys. Res. B, 59/60, 1056–1060.