1991
Reduction of secondary defect formation in MeV As ion implanted Si(100)
Publication
Publication
Nucl. Instrum. Methods Phys. Res. B , Volume 59/60 p. 614- 618
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Nucl. Instrum. Methods Phys. Res. B | |
Schreutelkamp, R, Lu, W.X, Liefting, J.R, Raineri, V, Custer, J.S, & Saris, F.W. (1991). Reduction of secondary defect formation in MeV As ion implanted Si(100). Nucl. Instrum. Methods Phys. Res., Sect B, 59/60, 614–618.
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