1992-01-01
Mesotaxy by nickel diffusion into a buried amorphous silicon layer
Publication
Publication
Mater. Sci. Eng. B
,
Volume 12
p. 103-
106
Additional Metadata | |
---|---|
Journal | Mater. Sci. Eng. B |
Citation |
Erokhin, Y.N, Grotzschel, R, Oktyabrsky, S.R, Roorda, S, Sinke, W.C, & Vyatkin, A.F. (1992). Mesotaxy by nickel diffusion into a buried amorphous silicon layer. Mater. Sci. Eng. B, 12, 103–106.
|