Mesotaxy by nickel diffusion into a buried amorphous silicon layer

1992-01-01

Mater. Sci. Eng. B , Volume 12 p. 103- 106

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Journal	Mater. Sci. Eng. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Erokhin, Y.N, Grotzschel, R, Oktyabrsky, S.R, Roorda, S, Sinke, W.C, & Vyatkin, A.F. (1992). Mesotaxy by nickel diffusion into a buried amorphous silicon layer. Mater. Sci. Eng. B, 12, 103–106.

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