Mesotaxy by nickel diffusion into a buried amorphous silicon layer

1992

Mater. Sci. Eng. B , Volume 12 p. 103- 106

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Journal	Mater. Sci. Eng. B
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Erokhin, Y. N., Grotzschel, R., Oktyabrsky, S. R., Roorda, S., Sinke, W., & Vyatkin, A. F. (1992). Mesotaxy by nickel diffusion into a buried amorphous silicon layer. Mater. Sci. Eng. B, 12, 103–106.

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