Additional Metadata
Journal Mater. Sci. Eng. B
Citation
Schreutelkamp, R, Custer, J. S, Raineri, V, Lu, W. X, Liefting, J. R, Saris, F.W, … Kaim, R. E. (1992). The role of extended defects on transient boron diffusion in ion-implanted silicon. Mater. Sci. Eng. B, 12, 307–325.