Limits to ion beam etching of Mo/Si multilayer coatings

1992-01-01

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Publisher	Optical Society of America
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Schlatmann, R, Lu, C, Verhoeven, J, Puik, E. J, & van der Wiel, M. J. (1992). Limits to ion beam etching of Mo/Si multilayer coatings. In Physics of X-ray Multilayer Structures, March 2-5, 1992, Jackson Hole Wyoming, Addendum and Postdeadline Papers. Optical Society of America.

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