A novel process to form epitaxial Si structures with buried silicide
|Publisher||Materials Research Society|
|Editor||G.S. Was , L.E. Rehn , D.M. Follstaedt|
Erokhin, Y.N, Grotzschel, R, Oktyabrsky, S.R, Roorda, S, Sinke, W.C, & Vjatkin, A.F. (1992). A novel process to form epitaxial Si structures with buried silicide. In G.S Was, L.E Rehn, & D.M Follstaedt (Eds.), Phase Formation and Modification by Beam-Solid Interactions : Symposium held December 2-6, 1991, Boston, Massachusetts, U.S.A. (pp. 313–318). Materials Research Society.