Negative ion source technology

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Publisher	Plenum
Editor	M. Capitelli , C. Gorse
Citation APA-ALL APA Style APA-ALL Style AAA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Hopman, H. J.& Heeren, R. (1992). Negative ion source technology. In M. Capitelli & C. Gorse (Eds.), Plasma Technology : Fundamentals and Applications (pp. 185–201).

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