Additional Metadata
Publisher Kluwer Academic Publishers
Editor S. Coffa , F. Priolo , E. Rimini , J. M. Poate
Citation
Liefting, J. R, Custer, J. S, Schreutelkamp, R, & Saris, F.W. (1992). Dislocation formation in Si implanted at elevated temperature. In S Coffa, F Priolo, E Rimini, & J. M Poate (Eds.), Crucial Issues in Semiconductor Materials and Processing Technologies : Proceedings of the NATO Advanced Study Institute on Semiconductor Materials and Processing Technologies, Erice, Italy, 1-13 July 1991 (pp. 219–224). Kluwer Academic Publishers.