Additional Metadata
Publisher Kluwer Academic Publishers
Editor S. Coffa , F. Priolo (Francesco) , E. Rimini , J.M. Poate
Liefting, J.R, Custer, J.S, Schreutelkamp, R, & Saris, F.W. (1992). Dislocation formation in Si implanted at elevated temperature. In S Coffa, F Priolo, E Rimini, & J.M Poate (Eds.), Crucial Issues in Semiconductor Materials and Processing Technologies : Proceedings of the NATO Advanced Study Institute on Semiconductor Materials and Processing Technologies, Erice, Italy, 1-13 July 1991 (pp. 219–224). Kluwer Academic Publishers.