Surface diffusion during thin film annealing studied by XPS

1993

Surf. Sci. , Volume 287/288 p. 901- 906

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Journal	Surf. Sci.
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Bot, A. C. W. C, van Slooten, U, Koppers, W. R, & Kleyn, A.W. (1993). Surface diffusion during thin film annealing studied by XPS. Surf. Sci., 287/288, 901–906.

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