Erbium ion implantation doping of opto-electronic materials operating at 1,5

1993

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Publisher	[s.n.]
Organisation	Photonic Materials
Citation APA-ALL APA Style APA-ALL Style AAA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Polman, A., Snoeks, E., van den Hoven, G. N., Custer, J. S., Hendriksen, B. L. M., Diemeer, M. B. J., van Uffelen, J. W. M., Oei, Y. S., Smit, M. K., Fleuster, M.& Buchal, C. (1993). Erbium ion implantation doping of opto-electronic materials operating at 1,5. 19th European Conference on Optical Communication, September 12-16, 1993, Centre De CongrÃ¨s Det d'Expositions, Montreaux, Switzerland, Proceedings Vol. 2 (Regular Papers), 61–64.

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