Annealing of ion-implanted hydrogenated amorphous silicon: Stable and removable damage

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Publisher	Materials Research Society
Editor	E. A. Schiff , M. J. Thompson , A. Madan , K. Tanaka , P. G. Lecomber
Citation APA Style AAA Style APA Style Cell Style Chicago Style Harvard Style IEEE Style MLA Style Nature Style Vancouver Style American-Institute-of-Physics Style Council-of-Science-Editors Style BibTex Format Endnote Format RIS Format CSL Format DOIs only Format	Berntsen, A, Stolk, P. A, van der Weg, W. F, & Saris, F.W. (1993). Annealing of ion-implanted hydrogenated amorphous silicon: Stable and removable damage. In E. A Schiff, M. J Thompson, A Madan, K Tanaka, & P. G Lecomber (Eds.), Amorphous Silicon Technology-1993 : Symposium held April 13-16, 1993, San Francisco, California, U.S.A. (pp. 303–308). Materials Research Society.

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