Surface X-ray diffraction has been used to monitor the growth of indium on silicon (111) as a function of temperature and to determine the atomic structure of the Si(111) 4 x 1-In reconstruction. The results indicate there are four indium atoms per 4 x 1 unit mesh with an average near neighbour separation which is reduced from that of the indium bulk.

Physica B

Finney, M.S, Norris, C, Howes, P.B, James, M.A, MacDonald, J.E, Johnson, A.D, & Vlieg, E. (1994). The growth and atomic structure of the Si(111)-indium interface studied by surface X-ray diffraction. Physica B, 198, 246–248.