In this paper we discuss two techniques to optimize the quality of multilayer x-ray mirrors, namely optimization of the temperature of the substrates during deposition and ion-bombardment of the layers. We produced Mo/Si multilayers applying both methods and present the effect on the near normal incidence reflectivity for l=13-14 nm radiation. Furthermore an analysis of the homogeneity of the deposited layers is given.

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Journal Microelectron. Eng.
Citation
Louis, E, Voorma, H. -J, Koster, N. B, Shmaenok, L, Bijkerk, F, Schlatmann, R, … Padmore, H. A. (1994). Enhancement of reflectivity of multilayer mirrors for soft x-ray projection lithography by temperature optimization and ion bombardment. Microelectron. Eng., 23, 215–218.