Low energy ion beam mixing as a tool for multilayer x-ray mirror fabrication
We present low energy ion beam mixing as a tool for the fabrication of composite layers with smooth interfaces. Using this tool we make a stack of alternating layers of Si and MoxSiy. We measure composition and interfacial roughness (s) and find x/yª and sª4 Å. The method can be applied to reduce absorption losses in x-ray multilayer mirrors for high-resolution dispersive purposes, and to increase thermal stability of multilayers. The thickness of the mixed layers is found
|Journal||Appl. Phys. Lett.|
Schlatmann, R, Keppel, A, Bultman, S, Weber, Thomas, & Verhoeven, J. (1996). Low energy ion beam mixing as a tool for multilayer x-ray mirror fabrication. Appl. Phys. Lett., 68, 2948–2950.