Halide perovskites have recently gained widespread attention for their high efficiencies in photovoltaics, and they have also been studied for applications in light emission. Both of these fields can benefit from nanophotonic patterning. Here, by controlling the crystallization of the perovskite film in contact with a nanotextured silicone polymer stamp, nanostructures are reproduced in the perovskite. Soft lithography techniques such as this imprinting are particularly useful for halide perovskites, which are incompatible with the aqueous solutions and plasmas used in conventional patterning processes. Additionally, soft lithography can pattern over defects and avoids damaging the master. By extending nanoscale soft lithography to halide perovskites, new opportunities arise in merging nanophotonics with these remarkable materials.

Additional Metadata
Publisher RSC
Funder ERC , Philips , NWO
Editor W.L. Noorduin (Willem)
Persistent URL dx.doi.org/10.1039/C7TC02775C
Journal J. Mater. Chem. C
Project LMPV
Brittman, S, Oener, S.Z, Guo, K, Abolins, H, Koenderink, A.F, & Garnett, E.C. (2017). Controlling crystallization to imprint nanophotonic structures into halide perovskites using soft lithography. J. Mater. Chem. C, 5(32), 8301–8307. doi:10.1039/C7TC02775C